High-resolution 157-nm imaging for lithography and micromachining applications


High-resolution 157-nm imaging for lithography and micromachining applications
Proc. SPIE, Vol. 4426, 401 (2002); DOI:10.1117/12.456887

 

Abstract

A Microstepper exposure tool for high-resolution imaging applications incorporating the F2 157nm laser is described. Details are presented of the optical architecture including beams shaping, homogenization and imaging objectives. Results from the high-resolution metrology, workpiece positioning and gas purging subsystems used in the tool are discussed. Use of the Microstepper for 70nm-node deep-iv lithography and submicron micromachining applications is presented.

 





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