High-resolution 157-nm laser micromachining of polymers


High-resolution 157-nm laser micromachining of polymers
Proc. SPIE, Vol. 4274, 158 (2001); DOI:10.1117/12.432548

 

Abstract

An Exitech Microstepper exposure tool has been used to laser micromachine a variety of polymeric materials with high resolution at a wavelength of 157 nm. We have demonstrated it is possible to machine thin film materials, different photoresists and fluorine-based polymers with submicron accuracy and resolution. The tool used for this work incorporated a 36x 0.5 NA Schwarzschild lens to project submicron resolution images of binary chrome-on-CaF2 masks onto free-standing and spun-on polymer films. The beam delivery system and the illuminator includes beam shaping and homogenization optics that allow fluences of greater than 1J/cm2 to be produced at the workpiece. Details of the optical system are presented together with process parameters and the results of the materials which have been machined.


 





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