High-resolution microlithography using a 193-nm excimer laser source


High-resolution microlithography using a 193-nm excimer laser source
Proc. SPIE, Vol. 3092, 471 (1997); DOI:10.1117/12.270110

 

Abstract

A 193 nm excimer laser microstepper has been developed for deep UV photolithography research and development and system details are presented. The tool incorporates a times 10, 0.5 NA, 4 mm field diameter, high-resolution imaging lens of either all-refractive or catadioptric design. An all-fused silica refractive lens has been used in the results reported here to carry out exposures in polymethylmethacrylate (PMMA) and polyvinylphonel (MX-P8) photoresists. Well-resolved images of 0.2 micrometer dense lines and spaces have been produced in the PMMA and MX-P8 resists.





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