Laser micromachining of optical materials with a 157-nm fluorine laser


Laser micromachining of optical materials with a 157-nm fluorine laser
Proc. SPIE, Vol. 4941, 77 (2003); DOI:10.1117/12.468234

 

Abstract

Vacuum UV laser micromachining is used to produce microstructures in common photonics materials. The ablation etch rates of lithium niobate, fused silica and indium phosphide are measured at 157nm and angled facets and v-grooves are machined into the materials using a high NA mask projection system. The applicability of such micromachined structures for photonics devices is discussed and future developments outlined.


 





Technology Solutions:
Copyright © 2012 M-Solv. All rights reserved.
Web design by Electric Studio
M-Solv Newsletter:
Subscribe to our newsletter to get updates on our products and services:
Unsubscribe
M-Solv is a member of: Chungnam Corporation