M-Solv will exhibit the new Hybrid Laser and Inkjet microprocessing research tool at LASER World of PHOTONICS in Munich, from June 15 to 18, 2009. Please visit us on the Booth of SOLITON In Hall C1 Booth 301

The MSV 101 has been designed as a fully configurable microstructuring research tool. It can be equipped with a wide variety of Solid State laser sources suitable for Direct write micromachining and thin film structuring for Microelectronics and Solar applications. Laser beams can be manipulated either by a fast Galvoscanner or by moving the substrate under a fixed focus with translation stages.

Pioneering Hybrid Technology

For the first time, a thin film research tool can be used to add and subtract materials in thin layers therefore allowing multi layered complex circuitry and structures to be created quickly. The MSV 101 can be additionally equipped with industrial ink jet technology allowing printing of functional materials in complex patterns.  Once printed, the pattern or image may be further defined or structured using the ablative laser technology.  The use of two technologies together on one machine not only saves capital cost, but also allows rapid multi layers to be built up without re-alignment, resulting in fast thin film component development.

To witness the technology please visit us at the Exhibition. http://world-of-photonics.net/en/laser/start