M-Solv employs a wide variety of high accuracy motion control systems such as x,y,z,θ transition stages used to manipulate the substrate or component under the laser beam or inkjet head.
Multi axis systems with advanced position synchronised output (PSO) enable reliable single pulse operation with nanometer accuracy.
Our systems have application specific architecture which may be either single axis for x and y gantry mounted overhead, or double gantry. The double gantry systems have the y stage mounted on the x stage which is ideal for compact R&D machines.
M-Solv prides itself on developing new and advanced laser processes in microelectronic, photovoltaic and flat panel display manufacture for both commercial and scientific applications. Click here.